Einsiedeln, Switzerland

André Bisig


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
1 patent (USPTO):Explore Patents

Title: André Bisig: Innovator in VCSEL Technology

Introduction

André Bisig is a notable inventor based in Einsiedeln, Switzerland. He has made significant contributions to the field of semiconductor technology, particularly in the design of Vertical-Cavity Surface-Emitting Lasers (VCSELs). His innovative approach has led to the development of a unique patent that addresses critical challenges in the alignment of VCSEL arrays.

Latest Patents

André Bisig holds a patent for a VCSEL array layout. This patent describes an array layout of VCSELs that is intentionally mis-aligned with respect to the xy-plane of the device structure, as defined by the crystallographic axes of the semiconductor material. The mis-alignment can take the form of skewing or rotating the emitter array. This innovative layout pattern retains the necessary row/column structure for dicing the structure into one-dimensional arrays while minimizing the risk that an extended defect along a crystallographic plane will affect a large number of individual emitters. He has 1 patent to his name.

Career Highlights

André Bisig is currently employed at II-VI Delaware, Inc., where he continues to advance his research and development efforts in semiconductor technologies. His work has positioned him as a key player in the field, contributing to the ongoing evolution of VCSEL applications.

Collaborations

Throughout his career, André has collaborated with notable colleagues, including Bonifatius Wilhelmus Tilma and Norbert Lichtenstein. These partnerships have fostered a collaborative environment that enhances innovation and drives technological advancements.

Conclusion

André Bisig's contributions to VCSEL technology exemplify the spirit of innovation in the semiconductor industry. His unique approach to array layouts not only addresses existing challenges but also paves the way for future advancements in the field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…