Delft, Netherlands

Andries Pieter Johan Effting

This inventor holds 3 USPTO granted patents and 1 published patent application and 4 EPO patents. Top assignee: Delmic IP B.v.. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andries Pieter Johan Effting. Retrieved from https://idiyas.com/inventor/andries-pieter-johan-effting

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.5

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):Explore Patents

Title: Andries Pieter Johan Effting: Innovator in Charged Particle Beam Technology

Introduction

Andries Pieter Johan Effting is a notable inventor based in Delft, Netherlands. He has made significant contributions to the field of charged particle beam technology, holding three patents that showcase his innovative approach to sample inspection.

Latest Patents

Effting's latest patents include an "Apparatus and method for detecting one or more scanning charged particle beams." This invention provides a method and apparatus for inspecting a sample using a charged particle column that generates and focuses charged particle beams onto the sample. The apparatus features a sample holder, a scanning deflector, a photon detector, and an optical assembly for imaging photons created during the interaction of the charged particle beams with the sample.

Another significant patent is the "Method and apparatus for inspecting a sample by means of multiple charged particle beamlets." This invention describes a multi-beam charged particle inspection apparatus that projects an array of charged particle beamlets onto a sample. The detection system is designed to capture X-Rays and cathodoluminescent light emitted from the sample due to the interaction with the charged particle beamlets.

Career Highlights

Andries Pieter Johan Effting is currently employed at Delmic IP B.V., where he continues to develop innovative technologies in the field of charged particle beams. His work has positioned him as a key figure in advancing inspection methods that enhance the accuracy and efficiency of sample analysis.

Collaborations

Effting collaborates with talented individuals such as Sander Vincent Den Hoedt and Lenard Maarten Voortman, contributing to a dynamic team focused on pushing the boundaries of charged particle technology.

Conclusion

Andries Pieter Johan Effting's contributions to charged particle beam technology through his patents and work at Delmic IP B.V. highlight his role as an influential inventor in the field. His innovative methods for sample inspection are paving the way for advancements in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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