Andrew P Clarke is a notable inventor based in Carpinteria, California. He has made significant contributions to the field of materials deposition technology. With a total of 4 patents to his name, Clarke's work has advanced the methods used in various industrial applications.

Latest Patents

Clarke's latest patents include an "Apparatus for, and method of, depositing a film on a substrate." This invention utilizes an electrical field between a positive anode and a negative target within a cavity, along with a magnetic field, to ionize neutral gas atoms. The ions facilitate the release of sputtered atoms for deposition on a substrate. Additionally, he has developed a method of depositing materials on a wafer to eliminate the effects of stress, which involves multiple conductive barrier layers to ensure uniform deposition.

Career Highlights

Clarke is currently associated with Sputtered Films, Inc., where he continues to innovate in the field of materials science. His work has been instrumental in enhancing the efficiency and effectiveness of film deposition processes.

Collaborations

Clarke collaborates with his coworker, Peter J Clarke, to further explore advancements in their field. Their combined expertise contributes to the innovative projects at Sputtered Films, Inc.

Conclusion

Andrew P Clarke's contributions to the field of materials deposition are noteworthy and reflect his commitment to innovation. His patents demonstrate a deep understanding of the complexities involved in film deposition technology.

Profile summary based on public USPTO records.