Redmond, WA, United States of America

Andrew Feldman


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Andrew Feldman: Innovator in Spectrum Shaping Technology

Introduction

Andrew Feldman is a notable inventor based in Redmond, WA, who has made significant contributions to the field of wireless communication. He is recognized for his innovative approach to signal processing, particularly in the area of crest factor reduction.

Latest Patents

Feldman holds a patent for "Spectrum Shaping Crest Factor Reduction." This patent discloses methods, systems, devices, and apparatuses that enhance radio transmission signals. The method involves receiving a signal and configuring crest factor reduction (CFR) processing characteristics at a wireless device. This configuration modifies portions of the signal based on an asymmetrical spectral mask, which limits the allowed magnitudes for frequency components. The asymmetrical spectral mask is defined according to multiple regulatory radio frequency (RF) power requirements, ensuring compliance with spectral characteristics.

Career Highlights

Andrew Feldman has established himself as a key figure in the technology sector, particularly through his work at Nanosemi, Inc. His expertise in signal processing and wireless communication has positioned him as a valuable asset in the industry.

Collaborations

Feldman has collaborated with talented individuals such as Alexandre Megretski and Zohaib Mahmood, contributing to advancements in their respective fields.

Conclusion

Andrew Feldman's innovative work in spectrum shaping and crest factor reduction exemplifies his commitment to enhancing wireless communication technology. His contributions continue to influence the industry and pave the way for future advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…