Company Filing History:
Years Active: 2011
Title: **Inventor Spotlight: Andreas Schutze**
Introduction
Andreas Schutze is an innovative inventor based in Feldkirch, Austria. With a strong focus on advancements in technology, he has contributed significantly to the field of plasma technology. His most notable invention is a vacuum plasma generator that enhances the treatment of workpieces in a vacuum chamber.
Latest Patents
Schutze holds a patent for a vacuum plasma generator. This sophisticated device features an output designed for feeding a plasma discharge, essential for the treatment of various workpieces within a vacuum environment. The generator includes a connection for AC voltage mains, a rectifier, and a converter with controls for adjusting the output voltage. It also incorporates a controlled full bridge circuit that converts output voltage into pulses ranging from 1 to 500 kHz. To ensure complete galvanic decoupling of the generator output, a potential-isolating transformer is integrated within the bridge design.
Career Highlights
Andreas Schutze is currently employed at Oerlikon Trading AG, located in Truebbach. His work at this esteemed company allows him to explore cutting-edge technological advancements within the field of plasma generation. His expertise in electrical engineering and dedication to innovation have positioned him as a noteworthy figure among contemporary inventors.
Collaborations
Throughout his career, Schutze has had the opportunity to work alongside talented individuals, including his coworker Gerhard Tuymer. Collaborations like these are instrumental in fostering a creative environment that nurtures innovation and drives technological advancement.
Conclusion
Andreas Schutze exemplifies the spirit of innovation through his contributions to plasma technology. His patent for the vacuum plasma generator highlights his ability to combine technical expertise with practical applications that benefit a wide array of industries. As he continues his work at Oerlikon Trading AG, the potential for further advancements remains promising.