Company Filing History:
Years Active: 2000
Title: The Innovations of Andreas Martin
Introduction
Andreas Martin is a notable inventor based in Frankfurt-am-Main, Germany. He has made significant contributions to the field of semiconductor cleaning solutions. His innovative approach has led to the development of a unique aqueous solution that enhances the cleaning process of semiconductor substrates.
Latest Patents
Andreas Martin holds a patent for an aqueous solution designed for cleaning semiconductor substrates. This solution primarily consists of a base, hydrogen peroxide, and a complexing agent. The complexing agent is a heterocyclic hydrocarbon with a ring size ranging from 9 to 18 atoms and includes at least three heteroatoms, such as nitrogen, oxygen, or sulfur. In particular, nitrogen-containing cryptands may be formed with functional reactive groups and/or aliphatic bridges between the nitrogen atoms, creating cage structures. This innovative cleaning solution is crucial for maintaining the integrity and performance of semiconductor devices.
Career Highlights
Andreas Martin is associated with Siemens Aktiengesellschaft, a leading global technology company. His work at Siemens has allowed him to focus on advancements in semiconductor technology and cleaning processes. His expertise in this area has positioned him as a valuable asset to the company and the industry.
Collaborations
Andreas collaborates with Bernd Kolbesen, who is also involved in the semiconductor field. Their partnership has fostered innovation and development in cleaning solutions for semiconductor substrates.
Conclusion
Andreas Martin's contributions to semiconductor cleaning technology exemplify the importance of innovation in the field. His patent for an aqueous cleaning solution showcases his commitment to enhancing semiconductor manufacturing processes.