Woodbury, MN, United States of America

Andrea Lynnae Hansen


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2006-2007

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2 patents (USPTO):Explore Patents

Title: Andrea Lynnae Hansen: Innovator in Photothermographic Materials

Introduction

Andrea Lynnae Hansen is a notable inventor based in Woodbury, MN (US). She has made significant contributions to the field of photothermographic materials, holding two patents that enhance the efficiency and stability of these materials.

Latest Patents

Hansen's latest patents include "Photothermographic reducing agents with bicyclic or tricyclic substitution" and "Photothermographic materials containing phosphors and methods of using same." The first patent focuses on bis phenol reducing agents that incorporate bicyclic and tricyclic substituents ortho to the hydroxyl groups on the aromatic rings. These agents improve silver efficiency and stability in photothermographic materials without significant loss in sensitometric properties. The second patent describes photothermographic materials that contain an X-radiation-sensitive phosphor, which emits in the range of about 100 to 410 nm. This phosphor can be a rare earth phosphate, a yttrium phosphate, a strontium phosphate, or a strontium fluoroborate, and these materials can be provided in organic solvent or aqueous solvent coating formulations.

Career Highlights

Throughout her career, Hansen has worked with prominent companies such as Eastman Kodak Company and Carestream Health, Inc. Her work has significantly impacted the development of photothermographic technologies.

Collaborations

Hansen has collaborated with notable coworkers, including Sharon Mary Simpson and Kurt DeLance Sieber, contributing to advancements in her field.

Conclusion

Andrea Lynnae Hansen's innovative work in photothermographic materials showcases her expertise and dedication to enhancing technology in this area. Her patents reflect her commitment to improving efficiency and stability in photothermographic applications.

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