Bellevue, WA, United States of America

Alpana N Ranade

USPTO Granted Patents = 8 


 

Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 17(Granted Patents)


Location History:

  • Renton, WA (US) (2018 - 2020)
  • Bellevue, WA (US) (2015 - 2021)

Company Filing History:


Years Active: 2015-2021

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8 patents (USPTO):Explore Patents

Title: Alpana N Ranade: Innovating in Thin Film Crystallization and Silicon-Oxy-Carbide Composites

Introduction:

Alpana N Ranade, a talented inventor based in Bellevue, WA, has made significant contributions to the field of material science and engineering. With a total of 8 patents to her name, Ranade's innovative work in thin film crystallization and silicon-oxy-carbide composites has garnered recognition in the industry.

Latest Patents:

1. Low temperature, thin film crystallization method and products prepared therefrom: Ranade's patent describes an organic material with a porous interpenetrating network and an amount of inorganic material partially distributed within the porosity. The method involves seeding with nanoparticles and depositing an amorphous material on the nanoparticles.

2. Composites including silicon-oxy-carbide layers and methods of making the same: This patent focuses on composites comprising silicon-oxy-carbide layers deposited onto a polymeric matrix substrate for enhanced thermo-oxidative stability. The atmospheric plasma deposition method creates a thermo-oxidative barrier coating or an adhesion-promoting layer.

Career Highlights:

Alpana N Ranade has showcased her expertise at renowned institutions and companies in the industry. She has notably worked at The Boeing Company, where her innovative contributions have been instrumental in advancing aerospace technologies. Additionally, Ranade has been associated with the University of Washington Center for Commercialization, where she has played a vital role in translating research findings into practical applications.

Collaborations:

Throughout her career, Ranade has collaborated with talented individuals who have further enriched her innovative pursuits. Some of her prominent coworkers include Marvi A Matos and Danilo C Pozzo, with whom she has shared insights and worked closely on research projects to push the boundaries of material science.

Conclusion:

Alpana N Ranade's commitment to pushing the boundaries of material science through her groundbreaking inventions in thin film crystallization and silicon-oxy-carbide composites exemplifies her dedication to innovation. Her impact in the field serves as an inspiration to aspiring inventors and underscores the importance of interdisciplinary collaborations in driving technological advancements.

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