Company Filing History:
Years Active: 1988
Title: The Innovations of Alois Litters
Introduction
Alois Litters is a notable inventor based in Lampertheim Hofheim, Germany. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on the removal of photoresist and stripper residues, which are critical in the semiconductor manufacturing process.
Latest Patents
Alois Litters holds a patent for an "Agent and method for the removal of photoresist and stripper residues." This innovative method allows for the rapid and complete removal of these residues from semiconductor substrates after the stripping process. The aqueous post-rinsing agent he developed contains a nonionogenic surfactant and an organic base, enhancing the efficiency of the cleaning process.
Career Highlights
Alois Litters is associated with Merck Patent Gesellschaft mit beschränkter Haftung, where he has been able to apply his expertise in semiconductor technology. His work has contributed to advancements in the industry, particularly in improving the cleaning processes used in semiconductor fabrication.
Collaborations
Alois has collaborated with Karl H. Neisius, further enhancing the innovative efforts within their field. Their partnership has led to the development of effective solutions for challenges faced in semiconductor manufacturing.
Conclusion
Alois Litters is a distinguished inventor whose work has significantly impacted the semiconductor industry. His innovative methods for removing photoresist and stripper residues demonstrate his commitment to advancing technology in this critical field.