Location History:
- Indianapolis, IN (US) (2013)
- Carmel, IN (US) (2014)
Company Filing History:
Years Active: 2013-2014
Title: The Innovative Contributions of Allison C. Tonk in Silicon Doping Technologies
Introduction
Allison C. Tonk is an accomplished inventor based in Carmel, Indiana. With a focus on enhancing silicon substrate technologies, he has secured two patents that reflect his expertise in the field of materials science. Tonk's work is instrumental in pushing the boundaries of electronic device manufacturing, particularly through novel doping methods.
Latest Patents
Allison C. Tonk's latest patents are centered around methods and compositions for doping silicon substrates. The first patent details a process involving a diluted dopant solution made up of tetraethylene glycol dimethyl ether (tetraglyme) combined with specific dopant-containing materials. The innovative approach includes treating the substrate with this solution and subsequently diffusing the dopant into the surface via rapid thermal annealing. Preferred dopants, such as diethyl-1-propylphosphonate and allylboronic acid pinacol ester, are included in the solution at concentrations ranging from 1% to 20%, with a more preferred dopant amount being 4% or less.
The second patent reiterates similar themes in the composition and methodology for doping silicon substrates. This consistent focus demonstrates Tonk's commitment to refining and optimizing doping techniques that could significantly benefit the semiconductor industry.
Career Highlights
Tonk is associated with Dynaloy, LLC, where he leverages his innovative mindset to help develop advanced solutions in silicon substrate technology. His career trajectory shows a dedication to enhancing manufacturing processes and materials, highlighting his role as a dynamic contributor in his company and in the field at large.
Collaborations
An important aspect of Tonk's professional journey includes his collaboration with Kimberly Dona Pollard. Working alongside her, he has been able to combine talents and insights to further advance their shared goals in the research and development of silicon doping technologies. Their collaborative efforts exemplify the power of teamwork in driving innovation.
Conclusion
Allison C. Tonk's work in silicon doping technologies not only results in valuable patents but also signifies substantial contributions to the electronic materials field. His innovative methodologies promise to enhance the function and efficiency of silicon substrates, showcasing the importance of ongoing research and development in creating advanced technologies that meet the growing needs of the industry.