Location History:
- Berkeley, CA (US) (1985)
- Oakland, CA (US) (1988 - 2002)
Company Filing History:
Years Active: 1985-2002
Title: Innovations of Allen M Carroll
Introduction
Allen M Carroll is a notable inventor based in Oakland, CA. He has made significant contributions to the field of lithography, particularly in the development of technologies that enhance precision and efficiency in semiconductor manufacturing. With a total of three patents to his name, Carroll's work reflects a deep understanding of the complexities involved in modern fabrication processes.
Latest Patents
One of Carroll's latest patents is titled "Border modification for proximity effect correction in lithography." This innovation focuses on dose conservation during the pattern modification phase of scanning beam lithography. The process allows for the correction of features to be exposed on substrates, such as masks or semiconductor wafers, while minimizing the impact on neighboring features. This results in a developed feature that meets the intended design edge location, even correcting for variations in resist profile angles based on localized feature packing density.
Another significant patent is the "Specimen distance measuring system." This system employs a plate to obstruct backscattered electrons produced by an electron beam, casting a shadow across a measurement detector sensitive to the shadow's position. The alignment of the shadow plate and measurement detector at approximately 45 degrees with the substrate enables calibration of the distance measuring system. This system is particularly useful as a height sensor in electron beam lithography apparatus, allowing for precise height measurements of substrates.
Career Highlights
Throughout his career, Allen M Carroll has worked with prominent companies in the technology sector, including Perkin-Elmer Corporation and Applied Materials, Inc. His experience in these organizations has contributed to his expertise in lithography and semiconductor technologies.
Collaborations
Carroll has collaborated with notable professionals in his field, including Charles S Biechler and Richard E Graves. These collaborations have likely enriched his work and contributed to the advancements in the technologies he has developed.
Conclusion
Allen M Carroll's contributions to the field of lithography through his innovative patents demonstrate his commitment to advancing semiconductor manufacturing technologies. His work continues to influence the industry and showcases the importance of precision in modern fabrication processes.