Allen Hase

Title: Allen Hase: Innovator in Atomic Layer Deposition Technology

Introduction

Allen Hase is a prominent inventor based in Lawrence, KS (US). He has made significant contributions to the field of materials science, particularly in the area of atomic layer deposition. His innovative work has led to the development of advanced technologies that enhance the fabrication of multilayer structures.

Latest Patents

Allen Hase holds a patent for an "Apparatus for in situ deposition of multilayer structures via atomic layer deposition and ultra-high vacuum physical or chemical vapor deposition." This apparatus is designed for the in situ fabrication of multilayer heterostructures. It comprises a first vacuum chamber for atomic layer deposition, a second vacuum chamber for ultra-high vacuum physical or chemical vapor deposition, and a load lock vacuum chamber that facilitates the transfer of substrates between these chambers. The design includes a substrate transport vacuum chamber equipped with a substrate transfer device, ensuring efficient and precise fabrication processes.

Career Highlights

Allen Hase is affiliated with the University of Kansas, where he has been instrumental in advancing research in his field. His work has not only contributed to academic knowledge but has also paved the way for practical applications in various industries. His dedication to innovation is evident in his patent and ongoing research efforts.

Collaborations

Allen has collaborated with notable colleagues, including Judy Zhihong Wu and Rongtao Lu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further enhancing the impact of their research.

Conclusion

Allen Hase's contributions to atomic layer deposition technology exemplify the spirit of innovation in materials science. His patent and collaborative efforts at the University of Kansas highlight his commitment to advancing the field and developing new technologies.