Los Alamos, NM, United States of America

Allan Hauer


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Innovations of Allan Hauer in Transient Unit Cell Measurement

Introduction

Allan Hauer is an accomplished inventor based in Los Alamos, NM (US). He has made significant contributions to the field of material science, particularly in the measurement of lattice parameters of single crystal materials. His innovative approach has led to the development of a unique method and apparatus that enhances the understanding of materials under transient shock waves.

Latest Patents

Hauer holds a patent for a "Method and apparatus for transient unit cell measurement." This invention provides a sophisticated technique for measuring the lattice parameters of single crystal materials while they are subjected to transient shock waves. The first embodiment of the patent involves the use of synchronized laser beam pulses to generate and measure x-rays that are Bragg-diffracted from both shocked and unshocked atomic planes of the crystal. This allows for precise measurements of the lattice parameters during the shock wave event.

Career Highlights

Allan Hauer is currently associated with the United States Navy, where he contributes his expertise in material science and engineering. His work has been instrumental in advancing the understanding of material behavior under extreme conditions. Hauer's innovative methods have the potential to impact various applications, including defense and aerospace technologies.

Collaborations

Hauer has collaborated with notable colleagues such as Robert R. Whitlock and Justin S. Wark. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in research.

Conclusion

Allan Hauer's contributions to the field of transient unit cell measurement exemplify the importance of innovation in material science. His patented methods not only enhance measurement accuracy but also pave the way for future research and applications in various high-tech industries.

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