Company Filing History:
Years Active: 1979
Title: **Alfred R. Triano, Jr.: A Pioneer in Semiconductor Devices**
Introduction
Alfred R. Triano, Jr. is an accomplished inventor based in Scotch Plains, NJ, whose expertise lies in the field of semiconductor technology. He holds a significant patent that has paved the way for advancements in Schottky barrier devices, demonstrating the impact of his work on modern electronics.
Latest Patents
Triano's notable patent involves a Schottky barrier semiconductor device and method of making it. This invention features a first layer of doped amorphous silicon created through a glow discharge in a mixture of silane and a doping gas. The first layer is carefully positioned on a substrate with excellent electrical properties. The invention also includes a second layer of amorphous silicon, spaced from the substrate, with a metallic film applied to create a surface barrier junction known as the Schottky barrier. The first layer is doped to ensure an ohmic contact with the substrate, with a graded doping concentration that peaks at the interface. Moreover, the design incorporates an intermediate layer to enhance the ohmic contact, while annealing and heat treatment steps are performed to optimize device efficiency.
Career Highlights
Triano has made significant contributions to RCA Inc., a renowned corporation known for its innovations in technology and electronics. His role at RCA has allowed him to develop cutting-edge solutions in semiconductor manufacturing, showcasing his dedication to advancing the field.
Collaborations
Throughout his career, Triano has collaborated with notable professionals, including David E. Carlson and Christopher R. Wronski. These collaborations have fostered an environment of innovation, allowing them to address complex challenges in semiconductor technology together.
Conclusion
Alfred R. Triano, Jr. stands out as a key figure in the development of Schottky barrier semiconductor devices. His inventive work not only reflects his technical prowess but also highlights the importance of collaboration and research in the advancement of technology. His contributions continue to resonate within the semiconductor industry, influencing future innovations and applications.