Company Filing History:
Years Active: 2003-2007
Title: The Innovative Contributions of Alex Buxbaum
Introduction
Alex Buxbaum is a prominent inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor processing, holding a total of 7 patents. His work focuses on improving the precision and performance of photoresists used in photomasks and reticles.
Latest Patents
One of Buxbaum's latest patents is an "Apparatus used in reshaping a surface of a photoresist." This invention relates to a method that enhances control over the dimensions of a patterned photoresist. It enables better control of the critical dimensions of a photomask or reticle fabricated using the patterned photoresist. The method involves treating a patterned photoresist with an etchant plasma to reshape its surface, effectively removing issues such as 't'-topping, standing waves, and feet formation at the base of the photoresist. This method is particularly beneficial for chemically amplified DUV photoresists.
Another notable patent is the "Method of producing a patterned photoresist used to prepare high performance photomasks." This innovation significantly reduces variations in critical dimensions from the target for features in a patterned photoresist. The method ensures that the photoresist binder resin system provides a dense structure that hinders the movement of photoacid-labile groups after irradiation. This improvement is crucial for maintaining the targeted critical dimensions of patterned photoresist features.
Career Highlights
Alex Buxbaum is currently employed at Applied Materials, Inc., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of photomasks used in the industry.
Collaborations
Buxbaum has collaborated with notable colleagues, including Melvin Warren Montgomery and Scott Edward Fuller. Their combined expertise has contributed to the successful development of innovative solutions in the field.
Conclusion
Alex Buxbaum's contributions to semiconductor processing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of high-performance photomasks and reticles, showcasing the importance of innovation in technology.