New York, NY, United States of America

Alan E Willner


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: Alan E. Willner: Pioneer in Photochemical Etching Technology

Introduction

Alan E. Willner, based in New York, NY, is a prominent inventor known for his significant contributions to the field of semiconductor technology. With a remarkable patent portfolio that includes innovative techniques for etching multilayered semiconductors, Willner has established himself as a leader in optical and electrical engineering.

Latest Patents

Alan E. Willner holds a patent for a "Method of localized photochemical etching of multilayered semiconductor." This groundbreaking invention utilizes the sensitivity of localized photochemical etching to selectively etch a laterally extending undercut in a buried layer of semiconductor materials. The process involves immersing the semiconductor body in an appropriate etching solution while directing a beam of light of specific wavelength and intensity onto the semiconductor solution interface. This method effectively harnesses the longer diffusion length for photogenerated carriers within the buried layer, enabling efficient etching and enhancement of semiconductor structures.

Career Highlights

Throughout his career, Alan E. Willner has greatly contributed to advancements in semiconductor technologies while working at Columbia University in the City of New York. His expertise has not only pushed the boundaries of photochemical etching but also facilitated the development of innovative solutions in various applications.

Collaborations

In his research endeavors, Alan E. Willner has collaborated with esteemed colleagues, including Mark N. Ruberto. Their joint efforts have played a crucial role in advancing the understanding and application of photochemical etching in semiconductor technology.

Conclusion

Alan E. Willner's pioneering work in localized photochemical etching has positioned him as an influential figure in the semiconductor domain. His innovative patented methods showcase the significant advancements being made in this critical area of technology, ultimately contributing to the future of electronic devices and materials.

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