Company Filing History:
Years Active: 1976
Title: Alan De Butcher: Innovator in High-Temperature Seal Technology
Introduction
Alan De Butcher is a notable inventor based in Parma Heights, Ohio. He has made significant contributions to the field of materials science, particularly in the development of high-temperature abradable seals. His innovative work has led to the creation of a unique composite structure that enhances the performance of sealing applications in extreme conditions.
Latest Patents
Alan De Butcher holds a patent for a "Graded metal-to-ceramic structure for high temperature abradable seal." This invention features an abradable seal composite structure that includes a porous, abradable ceramic surface layer resistant to high-temperature oxidation. The design incorporates a metallic bottom layer that can be bonded to a metallic substrate, with at least two intermediate layers consisting of ceramic/metal mixtures. The ceramic content is highest in the layer adjacent to the ceramic surface, with progressively lower ceramic content in the remaining layers, which have correspondingly higher metallic contents. The composite is produced by laying up the layers in wet paste form, drying them, and then heating the composite to bond it to the metallic substrate.
Career Highlights
Alan De Butcher is associated with Union Carbide Corporation, where he has applied his expertise in materials science to develop advanced sealing technologies. His work has been instrumental in improving the reliability and efficiency of high-temperature applications.
Collaborations
Alan has collaborated with Raymond John Elbert, contributing to the advancement of innovative sealing solutions. Their combined efforts have led to significant improvements in the performance of materials used in high-temperature environments.
Conclusion
Alan De Butcher's contributions to the field of high-temperature sealing technology exemplify the impact of innovative thinking in materials science. His patented work continues to influence the industry and enhance the performance of critical applications.