Sunol, CA, United States of America

Alan D'Entremont


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 205(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Alan D'Entremont: Innovator in Vacuum Processing Technology

Introduction

Alan D'Entremont is a notable inventor based in Sunol, California. He has made significant contributions to the field of vacuum processing systems, particularly with his innovative approach to substrate heating and cooling. His work has implications for various industries that rely on precise temperature control during processing.

Latest Patents

Alan D'Entremont holds a patent for a "Vacuum processing system having improved substrate heating and cooling." This invention is directed towards enhancing the efficiency of vacuum processing systems. The system features an evacuable chamber that includes a first section for increasing the temperature of a substrate and a second section for decreasing the temperature of a processed substrate. A thermal barrier is incorporated to isolate these two sections, ensuring optimal processing conditions.

Career Highlights

Throughout his career, Alan has been associated with Applied Materials, Inc., a leading company in the semiconductor and display technology sectors. His work at Applied Materials has allowed him to focus on advancing vacuum processing technologies, contributing to the company's reputation for innovation.

Collaborations

Alan has collaborated with notable colleagues, including Norman L. Turner and John M. White. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Alan D'Entremont's contributions to vacuum processing technology exemplify the impact of innovative thinking in engineering. His patent and work at Applied Materials, Inc. highlight his commitment to improving processing systems. His collaborations further enhance the potential for future advancements in the field.

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