Akitomo Teshima

Title: Akitomo Teshima: Innovator in Plasma Technology

Introduction

Akitomo Teshima is a notable inventor based in Isehara, Japan. He has made significant contributions to the field of plasma technology, particularly in the development of apparatuses and processes for diamond film deposition. With a total of 3 patents to his name, Teshima's work has advanced the capabilities of material synthesis.

Latest Patents

One of Teshima's latest patents is a plasma jet CVD apparatus for forming diamond films. This innovative apparatus features a first electrode designed as an enclosed body with a nozzle for jetting thermal plasma. A second electrode of opposite polarity is positioned within the nozzle. The apparatus includes a power source that applies a direct current voltage between the electrodes. As a gas is fed between the electrodes, it is transformed into thermal plasma, which is then jetted through the nozzle. Additionally, a starting gas feed system is incorporated to supply gaseous starting compounds for vapor phase deposition to the plasma jet, along with a powder supplying pipe for feeding metal powder between the electrodes.

Another significant patent involves a process for forming a mixed layer of a plasma sprayed material. This process allows for the creation of a diamond gas phase synthesized coating film that is easily controlled and offers high quality and good adhesion strength. It includes a step of forming a mixed layer of plasma spraying material and diamond by simultaneously conducting plasma injection and plasma CVD using distinct torches with separately controlled plasma generation conditions.

Career Highlights

Akitomo Teshima is currently associated with Fujitsu Corporation, where he continues to innovate in the field of plasma technology. His work has not only contributed to advancements in material science but has also positioned him as a key figure in the industry.

Collaborations

Teshima has collaborated with notable colleagues such as Motonobu Kawarada and Kazuaki Kurihara. These collaborations have further enriched his research and development efforts, leading to groundbreaking advancements in plasma technology.

Conclusion

Akitomo Teshima's contributions to plasma technology and diamond film deposition are noteworthy. His innovative patents and collaborations reflect his commitment to advancing material synthesis techniques. Teshima's work continues to influence the field and inspire future innovations.