Aichi, Japan

Akira Usami

This inventor holds 2 USPTO granted patents. Top assignees: Dainippon Screen Mfg. Co., Ltd., Japan Silicon Co., Ltd., Mitsubishi Kinzoku Kabushiki Kaisha. Active years: 1990-1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Usami. Retrieved from https://idiyas.com/inventor/akira-usami-ba6cky36

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 36(Granted Patents)


Company Filing History:


Years Active: 1990-1993

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2 patents (USPTO):Explore Patents

Title: Akira Usami: Innovator in Semiconductor Technology

Introduction

Akira Usami is a notable inventor based in Aichi, Japan, recognized for his contributions to semiconductor technology. With a total of two patents to his name, Usami has developed innovative methods that enhance the evaluation and inspection of semiconductor materials.

Latest Patents

Usami's latest patents include a "Method for Inspecting an Electronic State of a Surface of a Semiconductor" and a "Method for Contactless Evaluation of Characteristics of Semiconductor." The first patent involves applying a first light at a wavelength of 950 nm to a silicon wafer to generate electron-hole pairs. A microwave is then emitted to the silicon wafer, and the amount of reflection is measured. A second light at a wavelength of 633 nm is applied, and the reflection is measured again. The two amounts are normalized by the intensities of the lights, and a normalized finite difference is calculated to cancel errors resulting from the geometrical position between the measuring apparatus and the silicon wafer.

The second patent discloses a method for contactless evaluation of semiconductor wafers and devices. This method includes continuously irradiating focused microwaves on the surface of a semiconductor specimen and receiving the reflected microwaves. A focused laser beam pulse is then irradiated on the specimen, and the lifetime is measured from the time-history of the reflected microwaves. The method allows for improved resolution during measurement and evaluates the surface condition of the specimen.

Career Highlights

Throughout his career, Usami has worked with prominent companies such as Mitsubishi Kinzoku Kabushiki Kaisha and Japan Silicon Co., Ltd. His experience in these organizations has contributed significantly to his expertise in semiconductor technology.

Collaborations

Usami has collaborated with notable coworkers, including Makoto Imura and Kazunori Matsuki, who have also made significant contributions to the field.

Conclusion

Akira Usami's innovative methods in semiconductor technology demonstrate his commitment to advancing the field. His patents reflect a deep understanding of the complexities involved in semiconductor evaluation and inspection.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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