Akira Onoguchi

Title: Akira Onoguchi: Innovator in Charged Particle Technology

Introduction

Akira Onoguchi is a notable inventor based in Chofu, Japan, recognized for his contributions to the field of charged particle technology. With a total of 5 patents, Onoguchi has made significant advancements that enhance the performance of electrostatic lenses and X-ray systems.

Latest Patents

One of his latest patents is an electrostatic lens for charged particle radiation. This invention provides a lens performance that is relatively comparable to that of a magnetic type lens. The design includes a plurality of electrodes arranged on the incident side of charged particles, forming a first electric field area that reduces the orbit radii of the charged particles without exceeding their initial orbit radii. Additionally, a second electric field area applies force in the direction parallel to a central axis for the charged particles that have passed through the first area. Another significant patent is an X-ray converging mirror for an energy-dispersive fluorescent X-ray system. This mirror can be positioned adjacent to an X-ray source and features a reflecting surface with a cross-sectional profile defined by a specific curve equation.

Career Highlights

Throughout his career, Onoguchi has worked with prominent companies such as Kabushiki Kaisha Akashi Seisakusho and Horiba, Ltd. His work in these organizations has contributed to the development of innovative technologies in the field of charged particles and X-ray systems.

Collaborations

Onoguchi has collaborated with notable individuals in his field, including Shigetomo Yamazaki and Mitsuhisa Miyazawa. These collaborations have further enriched his work and led to advancements in technology.

Conclusion

Akira Onoguchi's contributions to charged particle technology and X-ray systems demonstrate his innovative spirit and dedication to advancing scientific knowledge. His patents reflect a commitment to improving the performance and efficiency of critical technologies.