Akira Nisi

Title: Akira Nisi: Innovator in Wafer Surface Inspection Technology

Introduction

Akira Nisi is a notable inventor based in Kiyotake, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the inspection of wafer surfaces. His innovative approaches have led to advancements in the efficiency and precision of wafer inspection processes.

Latest Patents

Akira Nisi holds a patent for an "Apparatus for inspecting wafer surface, method for inspecting wafer surface, apparatus for judging defective wafer, method for judging defective wafer, and apparatus for processing information on wafer surface." This invention allows for the inspection of scratches and staining on a wafer surface based on an LPD map obtained from a particle counter. The system detects aggregation of clustered point defects from two-dimensional distribution information, enhancing inspection efficiency and judgment precision regarding defective status. Additionally, it enables the detection of trends in scratches and staining during specified processes by accumulating wafer surface information, which can be shared between wafer suppliers and consumers for process improvement.

Career Highlights

Akira Nisi is associated with Sumco Techxiv Kabushiki Kaisha, where he has been instrumental in developing advanced technologies for wafer inspection. His work has contributed to the enhancement of semiconductor manufacturing processes, making them more reliable and efficient.

Collaborations

He has collaborated with notable colleagues, including Kouzou Matsusita and Yukinori Matsumura, who have also contributed to advancements in the field of semiconductor technology.

Conclusion

Akira Nisi's innovative work in wafer surface inspection technology has significantly impacted the semiconductor industry. His contributions continue to pave the way for improved manufacturing processes and quality assurance in semiconductor production.