Company Filing History:
Years Active: 1983-1985
Title: Akira Maruyama: Innovator in Photomask Technology
Introduction
Akira Maruyama is a prominent inventor based in Hino, Japan. He has made significant contributions to the field of photomask technology, holding 2 patents that showcase his innovative approach to materials used in photomasks.
Latest Patents
Maruyama's latest patents include a novel photomask material that comprises a substrate and at least one layer containing a mixture of a metal oxide and a metal nitride. This photomask material exhibits excellent resistance to cleaning solutions, allowing for repeated use. Another notable patent is for a photomask blank that features a transparent electroconductive layer. This design includes a base with a transparent electroconductive material coated on it, along with a heavy metal oxide layer laminated in direct contact or through an intermediary light-screening layer.
Career Highlights
Maruyama is currently employed at Konishiroku Photo Industry Co., Ltd., where he continues to develop advanced materials for photomasks. His work has been instrumental in enhancing the performance and durability of photomask technologies.
Collaborations
Throughout his career, Maruyama has collaborated with notable colleagues, including Takashi Hatano and Keiko Hioka. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Akira Maruyama's contributions to photomask technology reflect his dedication to innovation and excellence in his field. His patents not only advance the technology but also pave the way for future developments in the industry.