Company Filing History:
1 out of 2,248 
1 out of 25,560 
Years Active: 1997
Title: The Innovative Contributions of Akira Ishihama
Introduction: Akira Ishihama, an inventive mind hailing from Nara, Japan, has made significant strides in the realm of semiconductor technology. With one notable patent to his name, Ishihama has developed an effective stripping and cleaning agent aimed at enhancing the semiconductor manufacturing process.
Latest Patents: Akira Ishihama holds a patent for a stripping and cleaning agent designed for removing dry etching and photoresist residues. The innovative formula contains from 5 to 50% by weight of an organocarboxylic ammonium salt or an amine carboxylate, which aids in effectively treating dry-etched semiconductor substrates. This method is particularly beneficial for semiconductor wafers that have conductive aluminum layers, allowing for the complete removal of side wall protection films and resist residues without damaging the wiring body.
Career Highlights: Ishihama's career reflects his commitment to advancing technology. He has contributed his expertise while working at prominent companies such as Mitsubishi Gas Chemical Company, Inc. and Sharp Corporation. His work has played a crucial role in enhancing semiconductor processes and improving manufacturing efficiency.
Collaborations: Throughout his career, Akira Ishihama has collaborated with notable colleagues, including Tetsuo Aoyama and Rieko Nakano. Their combined efforts have been instrumental in refining the processes surrounding semiconductor treatments and have contributed significantly to the field.
Conclusion: Akira Ishihama's innovative approach to developing semiconductor cleaning solutions highlights his impact on the technology landscape. Through his patent and collaborations, he has paved the way for advancements in semiconductor manufacturing that benefit the industry as a whole. Ishihama's work exemplifies the importance of innovation in driving progress and efficiency in technology.