Company Filing History:
4 out of 42,517 
1 out of 18 Years Active: 1993-1998
Title: Innovations of Akira Hirakawa: A Pioneer in Electron Beam Exposure Technology
Introduction: Akira Hirakawa, based in Katsuta, Japan, is an innovative inventor recognized for his contributions to the field of semiconductor technology. With a total of four patents to his name, Hirakawa has significantly advanced exposure methods and pattern data preparation systems, enhancing the reliability and efficiency of semiconductor manufacturing processes.
Latest Patents: Among Hirakawa's notable inventions is a sophisticated exposure method that incorporates pattern-selective exposure, enabling high reliability through the use of both repeated and non-repeated patterns. This cutting-edge technology improves the preparation efficiency of pattern data, ensuring the secure inspection of aperture patterns. The invention employs an electron beam as a focused beam, facilitated by an advanced pattern exposure apparatus which includes an electron beam drawing section, a control I/O section, a drawing control section, and a data storage section. The EB drawing section is designed to mount a semiconductor wafer on a platform, utilizing a structured path involving several components such as masks, blanking electrodes, and deflectors to accurately manage the electron beam during exposure.
Career Highlights: Akira Hirakawa has a distinguished career, having worked for renowned companies such as Hitachi, Ltd. and Hitachi Instrument Engineering Co., Ltd. His contributions in these organizations have driven advancements in semiconductor technology and have cemented his reputation as a leading inventor in his field.
Collaborations: Throughout his career, Hirakawa has collaborated with other esteemed individuals, including Yukinobu Shibata and Ikuo Takada. These collaborations have been pivotal in fostering innovation and pushing the boundaries of semiconductor technologies.
Conclusion: Akira Hirakawa's work in electron beam exposure technology has not only resulted in important patents that enhance the semiconductor industry but also reflects the spirit of ingenuity and collaboration in innovation. His achievements continue to influence future developments in pattern exposure methods and semiconductor fabrication processes, solidifying his legacy as a key inventor in this specialized domain.