Company Filing History:
Years Active: 2003
Title: Akira Higuchi: Innovator in Electron Beam Technology
Introduction
Akira Higuchi is a notable inventor based in Machida, Japan. He has made significant contributions to the field of electron beam technology, particularly in the area of proximity exposure apparatus. His innovative work has led to advancements that enhance the precision and accuracy of electron beam measurements.
Latest Patents
Higuchi holds a patent for a "Method of measuring and calibrating inclination of electron beam in electron beam proximity exposure apparatus, and electron beam proximity exposure apparatus." This patent describes a calibration mask with multiple pre-formed marks. The method involves using a deflector to control the deflection of electron beams, ensuring they are incident on a mark of the calibration mask. The beams then pass through the mark and impinge on two Faraday cups, where the electrical quantities detected are maximized. The positional coordinates on an XY stage are recorded for each mark, allowing for the calculation of the inclination of the electron beams based on the detected coordinates and the height differences between the marks. This process enables accurate measurement of electron beam inclination.
Career Highlights
Higuchi is currently associated with Leepl Corporation, where he continues to develop and refine technologies related to electron beam applications. His expertise in this niche area has positioned him as a key figure in advancing electron beam calibration methods.
Collaborations
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Conclusion
Akira Higuchi's contributions to electron beam technology exemplify the impact of innovative thinking in engineering. His patent reflects a commitment to enhancing measurement accuracy, which is crucial for advancements in various technological applications.