Kokubu, Japan

Akira Furusawa


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: The Innovations of Akira Furusawa

Introduction

Akira Furusawa, an accomplished inventor based in Kokubu, Japan, has made significant contributions to the technology sector, particularly in the development of semiconductor devices. With one patent to her name, Furusawa is recognized for her inventive work that combines advanced materials to enhance electronic functionalities.

Latest Patents

Furusawa's notable patent relates to a "High dielectric layer-containing alumina-based wiring substrate." This invention details a semiconductor device package that comprises a high dielectric layer made of alumina particles combined with specific high permittivity-imparting agents, such as tungsten (W) or molybdenum (Mo), as well as other components. Additionally, the patent describes electrode layers positioned on either side of the dielectric layer, which consist primarily of valuable metals like W and Mo, further enhancing the device's performance through finely engineered insulation layers composed of alumina particles.

Career Highlights

Furusawa is employed at Kyocera Corporation, a leading global technology firm known for its innovation in electronics and ceramics. Throughout her career, she has contributed to numerous projects aimed at improving semiconductors, showcasing her expertise and dedication to advancing technology.

Collaborations

In her journey as an inventor, Furusawa has collaborated with esteemed colleagues, including Kunihide Shikata and Takeshi Kubota. Their collective efforts have fostered a creative environment that encourages the development of groundbreaking technologies and solutions within the semiconductor field.

Conclusion

Akira Furusawa's innovations reflect her commitment to enhancing electronic devices through advanced materials and engineering. As she continues to work at Kyocera Corporation alongside dedicated professionals, her contributions will undoubtedly influence the future of semiconductor technology. Her patent stands as a testament to her ingenuity and passion for invention in this crucial area of technological advancement.

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