Itami, Japan

Akira Fukui


Average Co-Inventor Count = 3.4

ph-index = 7

Forward Citations = 88(Granted Patents)


Location History:

  • Hyogo, JP (1984 - 2005)
  • Itami, JP (2000 - 2005)

Company Filing History:


Years Active: 1984-2005

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12 patents (USPTO):Explore Patents

Title: Akira Fukui: Innovator in Semiconductor Technology

Introduction

Akira Fukui is a prominent inventor based in Itami, Japan, known for his significant contributions to semiconductor technology. With a total of 12 patents to his name, Fukui has made remarkable advancements in the field, particularly in the development of substrate materials for semiconductor devices.

Latest Patents

Fukui's latest patents include innovative designs for substrate materials that enhance the performance of semiconductor devices. One of his notable inventions is a substrate material made of an aluminum/silicon carbide composite alloy. This material boasts a thermal conductivity of 100 W/m·K or higher and a thermal expansion coefficient of 20×10⁻⁶ °C or lower, making it lightweight and compositionally homogeneous. Another significant patent focuses on a low-cost aluminum-silicon carbide (Al-SiC) semiconductor substrate that maintains high dimensional accuracy and stability, even under varying practical shapes. This substrate is designed to incorporate a silicon carbide concentration of 5 to 60% by weight, ensuring excellent thermal performance.

Career Highlights

Throughout his career, Fukui has worked with esteemed companies such as Sumitomo Electric Industries, Limited and Sumitomo Electric Industrial Co., Ltd. His work has been instrumental in advancing semiconductor technology, particularly in the development of materials that improve device efficiency and reliability.

Collaborations

Fukui has collaborated with notable colleagues, including Shinichi Yamagata and Yugaku Abe, who have contributed to his research and development efforts in the semiconductor field.

Conclusion

Akira Fukui's innovative work in semiconductor technology has led to significant advancements in substrate materials, enhancing the performance and efficiency of semiconductor devices. His contributions continue to influence the industry and pave the way for future innovations.

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