Company Filing History:
Years Active: 2020-2021
Title: Akira Amano: Innovator in Silicon Carbide Semiconductor Technology
Introduction
Akira Amano is a prominent inventor known for his contributions to semiconductor technology. He is based in Kariya, Japan, and holds two patents that showcase his innovative work in the field. His expertise has significantly impacted the development of silicon carbide semiconductor devices.
Latest Patents
Amano's latest patent focuses on a silicon carbide semiconductor device and the method of manufacturing it. The invention involves measuring the film thickness of a second epitaxial film by irradiating infrared light from the surface of the second epitaxial film onto a base layer. This method allows for the measurement of reflected light from both the interface between the first epitaxial film and the base layer, as well as from the surface of the second epitaxial film. By obtaining a two-layer film thickness, which represents the total thickness of both films, Amano's method calculates the film thickness of the second epitaxial film by subtracting the one-layer film thickness of the first epitaxial film.
Career Highlights
Throughout his career, Akira Amano has worked with notable companies such as Denso Corporation and Toyota Motor Corporation. His experience in these leading organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Amano has collaborated with several talented individuals in his field, including Takayuki Satomura and Yuichi Takeuchi. These collaborations have further enhanced his work and contributions to semiconductor technology.
Conclusion
Akira Amano's innovative work in silicon carbide semiconductor devices has made a significant impact in the field of technology. His patents and collaborations reflect his dedication to advancing semiconductor manufacturing methods.