Company Filing History:
Years Active: 1998-2001
Title: Akio Takemoto: Innovator in Charged-Particle Beam Technology
Introduction
Akio Takemoto is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of charged-particle beam technology, holding a total of 3 patents. His work has advanced the methods and devices used in wafer exposure processes, which are crucial in semiconductor manufacturing.
Latest Patents
Takemoto's latest patents include innovative methods and devices for exposing wafers to charged-particle beams. One of his notable inventions is a charged-particle-beam exposure device and method. This method involves directing a charged-particle beam, deflected by a deflector, onto a wafer. The process includes arranging multiple first marks at varying heights, focusing the beam on each mark using a focus coil, and obtaining focus distances and deflection-efficiency-correction coefficients for precise exposure.
Career Highlights
Throughout his career, Akio Takemoto has been associated with Fujitsu Corporation, where he has played a vital role in developing advanced technologies. His expertise in charged-particle beam applications has positioned him as a key figure in the semiconductor industry.
Collaborations
Takemoto has collaborated with notable colleagues, including Yoshihisa Ooaeh and Tomohiko Abe. These partnerships have fostered innovation and contributed to the success of their projects.
Conclusion
Akio Takemoto's contributions to charged-particle beam technology exemplify his dedication to innovation in the semiconductor field. His patents and collaborative efforts continue to influence advancements in wafer exposure methods.