Location History:
- Tsukuba, JP (2002 - 2012)
- Nagoya, JP (2010 - 2015)
- Aichi, JP (2015)
Company Filing History:
Years Active: 2002-2015
Title: Akinori Kitamura: Innovator in Polysiloxane Technology
Introduction
Akinori Kitamura is a prominent inventor based in Nagoya, Japan. He has made significant contributions to the field of polysiloxane technology, holding a total of 10 patents. His innovative work focuses on methods and compositions that enhance the performance of organic semiconductor insulating films.
Latest Patents
One of Kitamura's latest patents is a method for producing polysiloxane. This method involves a condensation step where hydrolysis and polycondensation of a starting material monomer occur in a reaction solvent containing specific secondary and tertiary alcohols. This innovative approach effectively suppresses issues such as gelation during production and storage.
Another notable patent is for a composition for organic semiconductor insulating films. This composition aims to create an insulating film that exhibits excellent hydrophobicity and surface smoothness while maintaining electrical stability. The composition includes a polysiloxane and an organic polymer compound, specifically designed to enhance the properties of the insulating film.
Career Highlights
Akinori Kitamura is currently associated with Toagosei Company, Ltd., where he continues to develop cutting-edge technologies in the field of materials science. His work has been instrumental in advancing the applications of polysiloxane in various industries.
Collaborations
Kitamura has collaborated with notable colleagues, including Hiroshi Suzuki, contributing to the collective expertise in their research endeavors.
Conclusion
Akinori Kitamura's innovative contributions to polysiloxane technology and organic semiconductor materials highlight his role as a leading inventor in his field. His patents reflect a commitment to enhancing material performance and addressing industry challenges.