Company Filing History:
Years Active: 1993-2003
Title: Akihito Tsukuno: Innovator in Silicon Chemistry
Introduction
Akihito Tsukuno is a notable inventor based in Annaka, Japan. He has made significant contributions to the field of silicon chemistry, holding a total of 5 patents. His work focuses on innovative methods for synthesizing organosilicon compounds, which are essential in various industrial applications.
Latest Patents
One of Tsukuno's latest patents is the preparation of diorganodichlorosilane. This invention involves subjecting organochlorosilanes to a disproportionation reaction in the presence of a SiH group-containing compound and specific catalysts. The process allows for the reaction to occur under atmospheric pressure and low temperatures, enhancing safety and simplifying the reaction equipment. Another significant patent is the method for preparing monosilanes from a high-boiling fraction formed during the direct synthesis of methylchlorosilanes. This method improves the conversion of disilanes into monosilanes by utilizing hydrogen chloride in the presence of an amine or amide catalyst.
Career Highlights
Tsukuno is currently employed at Shin-Etsu Chemical Co., Ltd., a leading company in the chemical industry. His work at this organization has allowed him to further develop his innovative ideas and contribute to advancements in silicon chemistry.
Collaborations
Throughout his career, Tsukuno has collaborated with esteemed colleagues such as Masao Maruyama and Masaaki Furuya. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Akihito Tsukuno's contributions to silicon chemistry through his patents and collaborations highlight his role as an influential inventor. His innovative methods continue to impact the industry positively, showcasing the importance of research and development in advancing chemical technologies.