Yatabe, Japan

Akihisa Matsuda


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: **Akihisa Matsuda: Innovator in Silicon Thin Films**

Introduction

Akihisa Matsuda, based in Yatabe, Japan, is a notable inventor in the field of materials science, particularly recognized for his work related to silicon thin films. His invention focuses on improving the properties and production methods of silicon layers used in various technological applications, which has significant implications for advances in electronics and semiconductor technologies.

Latest Patents

Matsuda holds a patent for a "Silicon thin film and method of producing the same." This innovation involves a silicon thin film composed primarily of silicon atoms, incorporating up to 8 atm % hydrogen, along with at least one additional element from a specified group including fluorine, chlorine, bromine, and iodine. His method is designed to create a layer where approximately 80 to 100% of microcrystalline grains are integrated within an amorphous phase. The production technique entails deposition on a substrate within a plasma atmosphere, utilizing silane or halogenated silane as raw material gases, combined with a dopant gas.

Career Highlights

Matsuda's impressive career includes his association with Toa Nenryo Kogyo, K.K., a company that specializes in innovative material solutions. His contributions to the field are underscored by his significant patent, showcasing his expertise and commitment to advancing silicon technologies.

Collaborations

Throughout his career, Matsuda has collaborated with esteemed colleagues, including Shigeru Iijima and Kazunobu Tanaka. These partnerships have facilitated the exchange of ideas and fostered innovative approaches to research and development in the semiconductor domain.

Conclusion

Akihisa Matsuda represents the spirit of innovation in Japan, particularly in the development of silicon thin films. His patent demonstrates a progressive approach to material sciences, and his collaborations highlight the importance of teamwork in achieving technological advancements. As the field evolves, Matsuda's contributions will remain influential in shaping the future of electronics and semiconductors.

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