Company Filing History:
Years Active: 2012
Title: Akihiko Naitoh: Innovator in Light Exposure Mask Management
Introduction
Akihiko Naitoh is a prominent inventor based in Tokyo, Japan. He is known for his innovative contributions to the field of light exposure mask management. His work focuses on improving the efficiency and cleanliness of light exposure masks used in various applications.
Latest Patents
Naitoh holds a patent for a "Method for managing light exposure mask and light exposure mask." This invention aims to provide a method that eliminates the need for mask inspection or wafer inspection to manage contamination from foreign matter. The method is designed to be versatile, regardless of the mask's history, and does not increase the time or cost associated with mask manufacturing and inspection. It ensures that the mask can always be used in a clean state.
Career Highlights
Akihiko Naitoh is associated with Dai Nippon Printing Co., Ltd., where he has made significant contributions to the development of light exposure technologies. His expertise in this area has led to advancements that benefit the industry.
Collaborations
Naitoh has worked alongside notable colleagues such as Shu Shimada and Hideki Yamamoto. Their collaborative efforts have furthered research and development in the field of light exposure masks.
Conclusion
Akihiko Naitoh's innovative work in managing light exposure masks showcases his commitment to enhancing technology in this field. His contributions are vital for ensuring the efficiency and cleanliness of light exposure processes.