Company Filing History:
Years Active: 2020
Title: Aki Nakamichi: Innovator in Film-Forming Technology
Introduction
Aki Nakamichi is a notable inventor based in Shizuoka, Japan. He has made significant contributions to the field of film-forming compositions, particularly through his innovative patent. His work is recognized for its potential applications in various industries, showcasing his expertise and creativity.
Latest Patents
Aki Nakamichi holds a patent for a film-forming composition and manufacturing method of laminate. This invention includes a film-forming composition that contains a hydrolysate of a siloxane compound, silica particles, a ketone-based solvent, and water. The manufacturing method is designed to create a laminate using these components. The siloxane compound is represented by a specific formula where R, R, R, and R each represent a monovalent organic group with 1 to 6 carbon atoms, and n is an integer ranging from 2 to 20. This patent highlights Nakamichi's innovative approach to material science.
Career Highlights
Aki Nakamichi is associated with Fujifilm Corporation, a leading company in imaging and information technology. His role at Fujifilm has allowed him to work on cutting-edge technologies and contribute to the company's advancements in film-forming materials. His expertise in this area has positioned him as a valuable asset to the organization.
Collaborations
Throughout his career, Aki Nakamichi has collaborated with talented individuals such as Takeshi Hama and Yusuke Hatanaka. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Aki Nakamichi is a distinguished inventor whose work in film-forming technology has made a significant impact. His patent and contributions to Fujifilm Corporation exemplify his dedication to innovation and excellence in his field.