Company Filing History:
Years Active: 2025
Title: Aichen Wu: Innovator in Ultra-Precision Lithography
Introduction
Aichen Wu is a prominent inventor based in Harbin, China. He has made significant contributions to the field of ultra-precision lithography, particularly through his innovative patent that addresses challenges in this area. His work is characterized by a focus on enhancing the accuracy and efficiency of lithographic processes.
Latest Patents
Aichen Wu holds a patent for a "Learning control system and method for ultra-precision lithographic apparatus based on uncertainty compensation." This learning control system comprises several key components, including a movement trajectory generation unit, a learning control unit, a feedback control unit, and an uncertainty compensation unit. The movement trajectory generation unit is responsible for creating a reference movement trajectory. A position measured signal is subtracted from this reference trajectory to produce a position error signal, which is then processed by the learning control unit. The learning control unit generates a feed-forward signal that, when combined with the position error signal, results in a corrected error signal. This corrected signal is subsequently input to the feedback control unit, which generates a feedback control quantity for the uncertainty compensation unit. Ultimately, the uncertainty compensation unit produces the position measured signal, enhancing the overall precision of the lithographic apparatus.
Career Highlights
Aichen Wu is affiliated with the Harbin Institute of Technology, where he has been instrumental in advancing research in ultra-precision lithography. His innovative approach to control systems has garnered attention in the field, showcasing his expertise and commitment to technological advancement.
Collaborations
Aichen Wu has collaborated with notable colleagues, including Fazhi Song and Pengyu Sun. These partnerships have contributed to the development of cutting-edge technologies in the realm of lithography.
Conclusion
Aichen Wu's contributions to ultra-precision lithography through his innovative patent demonstrate his significant role in advancing this critical field. His work continues to influence the development of more accurate and efficient lithographic systems.