Company Filing History:
Years Active: 1993
Title: Adolph Herbst: Innovator in Thermographic Photoresist Technology
Introduction
Adolph Herbst is a notable inventor based in Peekskill, NY (US). He is recognized for his contributions to the field of photoresist technology, particularly through his innovative patent.
Latest Patents
Adolph Herbst holds a patent for a thermographic reversible photoresist. This invention involves reaction products of organosilane compounds and a novolac resin that contains phenolic groups. These materials are capable of generating either positive or negative tone patterns, depending on the time and temperature of processing. This advancement in photosensitive materials has significant implications for various applications in the industry.
Career Highlights
Herbst has made substantial contributions during his career, particularly while working at International Business Machines Corporation (IBM). His work has been instrumental in advancing technologies that utilize photoresist materials.
Collaborations
Throughout his career, Adolph has collaborated with notable colleagues, including Peter A. Agostino and Frederick M. Pressman. These collaborations have further enriched his work and contributed to the development of innovative technologies.
Conclusion
Adolph Herbst's contributions to thermographic photoresist technology exemplify the impact of innovation in the field. His patent and collaborations highlight the importance of teamwork in advancing technological frontiers.