This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Addepalli Sai Susmita: Innovator in RF Filter Technology
Introduction
Addepalli Sai Susmita is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of plasma processing technology, particularly in the development of methods and apparatus for generating and controlling plasma.
Latest Patents
Addepalli holds a patent titled "Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambers." This innovative patent focuses on enhancing the efficiency of RF filters used in plasma chambers. The invention includes a plasma processing apparatus that features a chamber body, a powered gas distribution manifold, and a radio frequency (RF) filter. The design incorporates a substrate-supporting surface and a heating assembly to control the temperature profile effectively.
Career Highlights
Addepalli Sai Susmita is currently associated with Applied Materials, Inc., where he continues to advance his research and development efforts. His work is pivotal in improving the performance of plasma processing systems, which are essential in various industrial applications.
Collaborations
He has collaborated with esteemed colleagues such as Zheng John Ye and Abdul Aziz Khaja, contributing to a dynamic research environment that fosters innovation.
Conclusion
Addepalli Sai Susmita's contributions to RF filter technology and plasma processing are noteworthy. His patent reflects a commitment to advancing technological solutions in this critical field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile