This inventor holds 34 USPTO granted patents, primarily in Photosensitive Materials. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1976-1992.
Company Filing History:
Years Active: 1976-1992
Areas of Expertise:
Title: The Innovative Contributions of Abraham B. Cohen
Introduction: Abraham B. Cohen, based in Springfield, NJ, is a prominent inventor with an impressive portfolio of 34 patents. His work is primarily associated with E.I. du Pont de Nemours and Company, commonly known as DuPont, where he has significantly advanced technologies related to printed circuits and photohardenable compositions.
Latest Patents: Among his most recent innovations are two noteworthy patents. The first, titled "Embedded Catalyst Receptors for Metallization of Dielectrics," pertains to a laminate designed for the preparation of printed circuits that facilitates the electroless plating of conductive metals. The second patent, "Solid Imaging Method Using Multiphasic Photohardenable Compositions," details a process for forming an integral three-dimensional object from a photohardenable liquid that contains radiation-deflecting materials.
Career Highlights: Over his career, Cohen has made significant contributions to the field of materials science and engineering. His innovative approach to developing sustainable and efficient methods for circuit board manufacturing has earned him recognition in his industry and has impacted the way electronic devices are produced.
Collaborations: Throughout his career at DuPont, Cohen has collaborated with talented professionals, including Roxy N. Fan and Robert B. Heiart. These collaborations have not only fostered a creative work environment but have also led to the successful completion of numerous influential projects.
Conclusion: Abraham B. Cohen exemplifies the spirit of innovation in the field of technology and materials science. With a robust patent portfolio and a commitment to advancing industry standards, his contributions continue to shape the future of printed circuit technology and photohardenable materials.