Fremont, CA, United States of America

Abhijit Desai


Average Co-Inventor Count = 2.6

ph-index = 3

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 2006-2013

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3 patents (USPTO):Explore Patents

Title: Abhijit Desai: Innovator in Chemical Mechanical Polishing Technology

Introduction

Abhijit Desai is a notable inventor based in Fremont, California, recognized for his contributions to the field of chemical mechanical polishing (CMP) technology. With a total of three patents to his name, Desai has made significant advancements that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

One of Desai's latest patents is the "Self Cleaning and Adjustable Slurry Delivery Arm." This invention provides a slurry delivery and rinse system for CMP apparatuses that is capable of self-cleaning and can adjustably deliver both the slurry agent and rinse agent over a polishing pad. The design features a distributed slurry delivery arm (DSDA) with multiple manifolds and high-pressure rinse nozzles, ensuring optimal performance during the polishing process.

Another significant patent is the "Lamp Assembly Having Flexibly Positioned Rigid Plug." This lamp assembly is designed for substrate processing chambers and includes a tubular body with a lamp element and a flexibly positioned rigid plug. The innovative design allows for a range of movement, enhancing the functionality of the lamp assembly in various applications.

Career Highlights

Abhijit Desai is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display technology sectors. His work at Applied Materials has allowed him to collaborate on cutting-edge technologies that are pivotal in the manufacturing processes of electronic devices.

Collaborations

Desai has worked alongside talented colleagues, including Christopher Richard Mahon and Joseph Michael Ranish. Their collaborative efforts contribute to the innovative environment at Applied Materials, fostering advancements in CMP technology.

Conclusion

Abhijit Desai's contributions to the field of chemical mechanical polishing through his patents and work at Applied Materials highlight his role as a significant innovator. His inventions not only improve existing technologies but also pave the way for future advancements in substrate processing.

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