Neenah, WI, United States of America

Aaron Osland


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Aaron Osland

Introduction

Aaron Osland is a notable inventor based in Neenah, Wisconsin, who has made significant strides in the field of electrochemical sensors. His work focuses on developing advanced technologies that enhance the measurement capabilities of various mediums. With one patent to his name, Osland's contributions are noteworthy in the realm of innovation.

Latest Patents

Aaron Osland holds a patent for an electrochemical sensor, which is designed to measure a measurand of a medium surrounding the sensor. This invention features a housing with a chamber filled with a reference electrolyte and compressed air. The reference electrolyte is in electrolytic contact with the surrounding medium through a junction, specifically a diaphragm arranged in the chamber's wall. Additionally, the sensor includes a pickup electrode, which comprises an electric conductor immersed in the reference electrolyte. The reference half-cell is equipped with a measuring device capable of generating an electrical signal that correlates to the pressure within the chamber.

Career Highlights

Osland is currently employed at Endress+Hauser Conducta GmbH+Co. KG, where he continues to innovate and develop new technologies. His work at this esteemed company allows him to collaborate with other talented professionals in the field.

Collaborations

Some of Aaron Osland's coworkers include Stefan Paul and Jörg Uhle, who contribute to the collaborative environment that fosters innovation and creativity.

Conclusion

Aaron Osland's work in electrochemical sensors exemplifies the spirit of innovation and dedication to advancing technology. His contributions are significant in enhancing measurement techniques, and his ongoing work promises to lead to further advancements in the field.

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