The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2023
Filed:
May. 29, 2019
Asml Netherlands B.v., Veldhoven, NL;
Guido De Boer, GP Someren, NL;
Michel Pieter Dansberg, HP Berkel en Rodenrijs, NL;
Pieter Kruit, EB Delft, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target () such as a wafer, said target being included in said system by means of a target table (), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target () and target table (), a pressure drop (P) arises.