The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2018
Filed:
Sep. 12, 2016
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2005.12); G03F 7/028 (2005.12); C08F 214/18 (2005.12); C08F 220/30 (2005.12); G03F 7/20 (2005.12); G03F 7/038 (2005.12); C08F 26/06 (2005.12);
U.S. Cl.
CPC ...
G03F 7/0045 (2012.12); C08F 26/06 (2012.12); C08F 214/18 (2012.12); C08F 220/30 (2012.12); G03F 7/0382 (2012.12); G03F 7/2041 (2012.12); Y10S 430/114 (2012.12);
Abstract
A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition ensures an effective sensitivity, makes more uniform the distribution and diffusion of the acid generating component in a resist film, and suppresses deactivation of acid at the substrate interface. The pattern can be formed to a profile which is improved in LER and undercut.