logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US RE46736 B1

PDFFull Text
Date of Patent:
Feb. 26, 2018

Filed:

Sep. 12, 2016

Chemically amplified negative resist composition and patterning process

Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Keiichi Masunaga, Joetsu, JP;

Daisuke Domon, Joetsu, JP;

Satoshi Watanabe, Joetsu, JP;

Assignee:

SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;

Attorney:

Westerman, Hattori, Daniels & Adrian

Primary Examiner:

Jerry D Johnson

Int. Cl.
CPC ...
G03F 7/004 (2005.12); C08F 220/30 (2005.12); C08F 26/06 (2005.12); G03F 7/20 (2005.12); C08F 214/18 (2005.12); H01L 21/027 (2005.12); G03F 7/038 (2005.12);
U.S. Cl.
CPC ...
G03F 7/0045 (2012.12); C08F 26/06 (2012.12); C08F 214/18 (2012.12); C08F 220/30 (2012.12); G03F 7/0382 (2012.12); G03F 7/2041 (2012.12); H01L 21/0271 (2012.12); Y10S 430/114 (2012.12);
Abstract

A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition ensures an effective sensitivity, makes more uniform the distribution and diffusion of the acid generating component in a resist film, and suppresses deactivation of acid at the substrate interface. The pattern can be formed to a profile which is improved in LER and undercut.

Find Patent Forward Citations

Masunaga, Keiichi. (2018). Chemically amplified negative resist composition and patterning process (U.S. Patent No. RE46736). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/RE46736

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…