The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2013
Filed:
Jul. 18, 2012
Applicants:
Takayuki Abe, Kanagawa, JP;
Tetsuo Yamaguchi, Kanagawa, JP;
Fumio Hide, Kanagawa, JP;
Inventors:
Assignee:
Nuflare Technology, Inc., Numazu-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
G21K 1/00 (2005.12); G21K 5/10 (2005.12); H01J 37/21 (2005.12);
U.S. Cl.
CPC ...
Abstract
A writing method includes emitting a first charged particle beam formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece; and emitting a second charged particle beam formed to be a second shape by passing through the first shaping aperture and the second shaping aperture, wherein the second charged particle beam is superimposed onto a same position exposed by the first charged particle beam and is formed by using an opposite sides of respective first and second shaping apertures to those used for the first shape.