The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 2011
Filed:
Aug. 25, 2009
Applicants:
Mehran Mehregany, San Diego, CA (US);
Christian A. Zorman, Euclid, OH (US);
Xiao-an Fu, Louisville, KY (US);
Jeremy Dunning, Berea, OH (US);
Inventors:
Mehran Mehregany, San Diego, CA (US);
Christian A. Zorman, Euclid, OH (US);
Xiao-An Fu, Louisville, KY (US);
Jeremy Dunning, Berea, OH (US);
Assignee:
Case Western Reserve University, Cleveland, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2005.12);
U.S. Cl.
CPC ...
Abstract
A method of depositing a ceramic film, particularly a silicon carbide film, on a substrate is disclosed in which the residual stress, residual stress gradient, and resistivity are controlled. Also disclosed are substrates having a deposited film with these controlled properties and devices, particularly MEMS and NEMS devices, having substrates with films having these properties.