The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2009
Filed:
Apr. 30, 2007
Gu Xu, Rolla, MO (US);
Jimmy D. Meador, Ballwin, MO (US);
Mandar R. Bhave, Austin, TX (US);
Shreeram V. Deshpande, Ballwin, MO (US);
Kelly A. Nowak, Rolla, MO (US);
Gu Xu, Rolla, MO (US);
Jimmy D. Meador, Ballwin, MO (US);
Mandar R. Bhave, Austin, TX (US);
Shreeram V. Deshpande, Ballwin, MO (US);
Kelly A. Nowak, Rolla, MO (US);
Brewer Science Inc., Rolla, MO (US);
Abstract
New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.