The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 06, 1992

Filed:

Apr. 14, 1991
Applicant:
Inventors:

Robert A Lux, Toms River, NJ (US);

Ravi Khanna, Somerset, NJ (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437235 ; 437228 ; 148 333 ;
Abstract

The surface leakage on a III-V semiconductor is reduced by selectively grng a mixed oxide on the surface of the semiconductor to passivate the semiconductor and reduce the surface leakage.


Find Patent Forward Citations

Lux, Robert. (1992). Method of reducing the surface leakage on a iii-v semiconductor (U.S. Patent No. H001041). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/H001041

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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