The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 2018

Filed:

Jan. 26, 2016
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventors:

Hideto Dohi, Tokyo, JP;

Akira Ikegami, Tokyo, JP;

Hideyuki Kazumi, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/141 (2006.01); H01J 37/21 (2006.01); H01J 37/147 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/141 (2013.01); H01J 37/1471 (2013.01); H01J 37/1472 (2013.01); H01J 37/21 (2013.01); H01J 37/28 (2013.01); H01J 2237/04922 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/2809 (2013.01);
Abstract

In a charged particle beam device including an objective lens that focuses a charged particle beam; a first deflector that deflects the charged particle beam to emit the charged particle beam to a sample from a direction different from an ideal optical axis of the objective lens; and a second deflector that deflects a charged particle emitted from the sample, a charged particle focusing lens to focus the charged particle emitted from the sample is disposed between the sample and the second deflector and strengths of the objective lens and the charged particle focusing lens are controlled, according to deflection conditions of the first deflector.


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