The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 2018

Filed:

Jul. 11, 2014
Applicant:

Air Products and Chemicals, Inc., Allentown, PA (US);

Inventors:

John Anthony Thomas Norman, Encinitas, CA (US);

Sergei Vladimirovich Ivanov, Schnecksville, PA (US);

Xinjian Lei, Vista, CA (US);

Assignee:

VERSUM MATERIALS US, LLC, Tempe, AZ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/46 (2006.01); C23C 16/40 (2006.01); C07D 241/12 (2006.01); C23C 16/18 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/406 (2013.01); C07D 241/12 (2013.01); C23C 16/18 (2013.01); C23C 16/40 (2013.01); C23C 16/45553 (2013.01);
Abstract

A composition comprising dihydropyrazinyl anions that can be coordinated as 6 electron ligands to a broad range of different metals to yield volatile metal complexes for ALD and CVD depositions are described herein. Also described herein are undeprotonated dihydropyrazines that can coordinate to metals as stabilizing neutral ligands. In one embodiment, the composition is used for the direct liquid injection delivery of the metal dihydropyrazinyl complex precursor to the chamber of an ALD or CVD chamber for the deposition of metal-containing thin films such as, for example, ruthenium or cobalt metal films.


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